Publications - Photonic Materials

  • E. Alves, M.F. da Silva, G.N. van den Hoven, A. Polman, A.A. Melo and J.C. Soares, Incorporation and stability of erbium in sapphire by ion implantation, Nucl. Instrum. Methods Phys. Res., Sect B 106, 429-432 (1995)

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  • A. Polman, G.N. van den Hoven, J.S. Custer, J.H. Shin, R. Serna and P.F.A. Alkemade, Erbium in crystal silicon: optical activation, excitation, and concentration limits, J. Appl. Phys. 77, 1256-1262 (1995)

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  • G. Franzò, F. Priolo, S. Coffa, A. Polman and A. Carnera, Room temperature light emitting silicon diodes fabricated by erbium ion implantation, Nucl. Instrum. Methods Phys. Res., Sect B 96, 374-377 (1995)

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  • S. Lombardo, S.U. Campisano, G.N. van den Hoven and A. Polman, Room-temperature luminescence in semi-insulating polycrystalline silicon implanted with Er, Nucl. Instrum. Methods Phys. Res., Sect B 96, 378-381 (1995)

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  • J.H. Shin, G.N. van den Hoven and A. Polman, Direct experimental evidence for trap-state mediated excitation of Er3+ in silicon, Appl. Phys. Lett. 67, 377-379 (1995)

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  • G.N. van den Hoven, J.H. Shin, A. Polman, S. Lombardo and S.U. Campisano, Erbium in oxygen-doped silicon: optical excitation, J. Appl. Phys. 78, 2642-2650 (1995)

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  • F. Priolo, G. Franzò, S. Coffa, A. Polman, S. Libertino, R.C. Barklie and D. Carey, The erbium-impurity interaction and its effects on the 1.54 µm luminescence of Er3+ in crystalline silicon, J. Appl. Phys. 78, 3874-3882 (1995)

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  • J.S. Custer, A. Polman and H.M. van Pinxteren, Erbium in crystal silicon: segregation and trapping during solid phase epitaxy of amorphous silicon, J. Appl. Phys. 75, 2809-2817 (1994)

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  • M. Fleuster, C. Buchal, E. Snoeks and A. Polman, Optical and structural properties of MeV erbium implanted LiNbO3, J. Appl. Phys. 75, 173-180 (1994)

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  • G.N. van den Hoven, E. Radius, E. Snoeks, A. Polman, C. van Dam, J.W.M. van Uffelen and M.K. Smit: Er3+ absorption and optical gain in Al2O3 waveguides In: 1994 Conference on Lasers and Electro-Optics Europe, RAI Congress Centre Amsterdam, The Netherlands, 28 August-2 September, 1994, New York: IEEE, 1994.

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