C. Strohhöfer, P.G. Kik and A. Polman, Selective modification of the Er3+ 4I11/2 branching ratio by energy transfer to Eu3+, J. Appl. Phys. 88, 4486-4490 (2000)
T. Zijlstra, E. van der Drift, M.J.A. de Dood, E. Snoeks and A. Polman, Fabrication of two-dimensional photonic crystal waveguides for 1.5 mm in silicon by deep anisotropic dry etching, J. Vac. Sci. Technol. B 17, 2734-2739 (1999)
J.F. Suyver, P.G. Kik, T. Kimura, A. Polman, G. Franzò and S. Coffa, Optical and electrical doping of silicon with holmium, Nucl. Instrum. Methods Phys. Res., Sect B 148, 497-501 (1999)
M.L. Brongersma, A. Polman, K.S. Min and H.A. Atwater, Depth distribution of luminescent Si nanocrystals in Si implanted SiO2 films on Si, J. Appl. Phys. 86, 759-763 (1999)
S.I. Klink, G.A. Hebbink, L. Grave, F.C.J.M. van Veggel, D.N. Reinhoudt, L.H. Slooff, A. Polman and J.W. Hofstraat, Sensitized near-infrared luminescence from polydentate triphenylene-functionalized Nd3+, Yb3+, and Er3+ complexes, J. Appl. Phys. 86, 1181-1185 (1999)
T. van Dillen, M.L. Brongersma, E. Snoeks and A. Polman, Activation energy spectra for annealing of ion irradiation induced defects in silica glasses, Nucl. Instrum. Methods Phys. Res., Sect B 148, 221-226 (1999)
A.J. Vredenberg, A. Polman, P.A. Stolk, E. Snoeks, M.L. Brongersma and I.M.P. Aarts: Ion Beam Modification of Materials: Proceedings of the Eleventh International Conference on Ion Beam Modification of Materials, Amsterdam, The Netherlands, August 31 - September 4, 1998In: , Elsevier B.V., 1999. (Beam Interactions with Materials and Atoms; Sect. B of Nucl. Instr. & Meth. Phys. Res.;)
A. Polman, S. Coffa and R. Soref: Materials and Devices for Silicon-Based OptoelectronicsIn: , Pittsburgh: MRS, 1998. (Materials Research Society Symposium Proceedings;)
