Tailoring the optical properties of Si nanocrystals in SiO2: Materials issues and nanocrystal laser perspectives

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Reference M.L. Brongersma, K.S. Min, E. Boer, T. Tambo, A. Polman and H.A. Atwater: Tailoring the optical properties of Si nanocrystals in SiO2: Materials issues and nanocrystal laser perspectives In: Materials and Devices for Silicon-Based Optoelectronics : Symposium held December 1-3, 1997, Boston, Massachusetts, U.S.A. /ed. A. Polman, S. Coffa and R. Soref, Pittsburgh: MRS, 1998. - pp. 213-218
Group Photonic Materials

Si nanocrystals (diameter 2 – 5 nm) were formed by 35 keV Si+ implantation at a fluence of 6×1016 Si/cm2 into a 100 nm thick thermally grown SiO2 film on Si (100), followed by thermal annealing at 1100