Publications - Articles

  • J.G. Bannenberg and F.W. Saris, High energy implantation: present and future facilities, Nucl. Instrum. Methods Phys. Res., Sect B 37/38, 398-402 (1989)

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  • B. Pluis, J.M. Gay, J.W.M. Frenken, S. Gierlotka, J.F. van der Veen, J.E. MacDonald, A.A. Williams, N. Piggins and J. Als-Nielsen, X-ray reflectivity study of surface-initiated melting: density profile at the Pb(110) surface, Surf. Sci. 222, 845-852 (1989)

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  • C.W.T. Bulle-Lieuwma, A.F. de Jong, A.H.van van Ommen, J.F. van der Veen and J. Vrijmoeth, Determination of the coordination number of Co atoms at the CoSi2(A,B) / Si(111) interface by transmission electron microscopy, Appl. Phys. Lett. 55, 648-650 (1989)

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  • E.W. Kuipers, M.G. Tenner, A.W. Kleyn and S. Stolte, Steric effects for NO/Pt(111) adsorption and scattering, Phys. Rev. Lett. 62, 2152-2155 (1989)

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  • J. van Doorn, J.A. Moulijn and J.J. Boon, Characterization of carbon deposits on used hydrotreating catalysts by Curie-point pyrolysis, J. Anal. Appl. Pyrolysis 15, 333-345 (1989)

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  • R. van Silfhout, J.W.M. Frenken, J.F. van der Veen, S. Ferrer, A.D. Johnson, H.S. Derbyshire, C. Norris and J.E. MacDonald, In situ X-ray scattering studies of the deposition of Ge atoms on Ge(111), Colloq. Phys. 50, (1989)

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  • W. Koot, W.J. van der Zande, P.H.P. Post and J.H. Los, Branching ratios and lifetimes for the dissociative decay of triplet H2*, J. Chem. Phys. 90, 4826-4834 (1989)

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  • A. Polman, W.C. Sinke, M.J. Uttormark and M.O. Thompson, Pulsed-laser induced transient phase transformations at the Si-H2O interface, J. Mater. Res. 4, 843-856 (1989)

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  • E.W. Tegelaar, J.W. de Leeuw, C. Largeau, S. Derenne, H.-R. Schulten, J.J. Boon, M. Nip and J.C.M. Sprenkels, Scope and limitations of several pyrolysis methods in the structural elucidation of a macromolecular plant constituent in the leaf cuticle of Agave americana L, J. Anal. Appl. Pyrolysis 15, 29-54 (1989)

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  • H. den Daas, H. Zeijlemaker, J. Verhoeven, E.J. Puik and M.J. van der Wiel, The interaction of nickel with a carbon surface at 20-280 °C, J. Phys.: Condens. Matter 1, 261-262 (1989)

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