N. Wyplosz, M.C. Duursma, J.J. Boon and R.M.A. Heeren: Spatially-resolved TOF-MS analysis of paint materials and easel paintings samplesIn: Advances in Mass Spectrometry; Vol. 15 /ed. E. Gelpi, Weinheim: Wiley, 2001. - pp. 883-884
R.M.A. Heeren, M.C. Duursma, L. Drahos and K. Vékey: ESI-FTICR tandem mass spectrometry in the determination of internal energy relaxation rates of macromoleculesIn: Advances in Mass Spectrometry; Vol. 15 /ed. E. Gelpi, Weinheim: Wiley, 2001. - pp. 354-355
A.W. Kleyn: Probing the dynamics of chemisorption through scattering and stickingIn: Atomic and Molecular Beams : The State of the Art 2000 /ed. R. Campargue, Springer-Verlag, 2001. - pp. 873-886
H.G. Muller: Weakly relativistic stabilization: the effect of the magnetic fieldIn: Super-Intense Laser-Atom Physics /ed. B. Piraux and K. Rzazewski, Kluwer, 2001. - pp. 339-344
G.M. Languri, J. van der Horst, W.J. Muizebelt, R.M.A. Heeren and J.J. Boon: Monitoring the effects of traditional 19th century ADDITIVES on the chemical drying of OIL PAINT by mass spectrometryIn: Advances in Mass Spectrometry; Vol. 15 /ed. E. Gelpi, Weinheim: Wiley, 2001. - pp. 831-832
R.M.A. Heeren, M.C. Duursma, A. de Snaijer, P.G. Kistemaker and J.J. Boon: A novel surface induced dissociation tandem mass spectrometry set-upIn: Advances in Mass Spectrometry; Vol. 15 /ed. E. Gelpi, Weinheim: Wiley, 2001. - pp. 469-470
O.F. van den Brink, M.C. Duursma, J.J. Boon and R.M.A. Heeren: An ESI-FTMSMS study of the structure of photo-oxidised egg glycerolipidsIn: Advances in Mass Spectrometry; Vol. 15 /ed. E. Gelpi, Weinheim: Wiley, 2001. - pp. 889-890
K.-J. van den Berg, M.H. van Eikema Hommes, K.M. Groen, J.J. Boon and B.H. Berrie: On copper green glazes in paintingsIn: Art et Chimie, la Couleur: Actes du congrès /ed. J. Goupy and J.-P. Mohen, CNRS Editions, 2000. - pp. 18-23
O.F. van den Brink, S. Peulvé and J.J. Boon: Chemical changes in test paintings measure the environmental impact on the museum collectionIn: Art et Chimie, la Couleur: Actes du congrès /ed. J. Goupy and J.-P. Mohen, CNRS Editions, 2000. - pp. 121-125
N. Wyplosz, R. Koper, J. van der Weerd, R.M.A. Heeren and J.J. Boon: Improvements in surface preparation of paint cross-sections necessary for advanced imaging techniquesIn: Art et Chimie, la Couleur: Actes du congrès /ed. J. Goupy and J.-P. Mohen, CNRS Editions, 2000. - pp. 65-68