J.A. Dionne, L.A. Sweatlock, H.A. Atwater and A. Polman, Planar metal plasmon waveguides: frequency-dependent dispersion, propagation, localization, and loss beyond the free electron model, Phys. Rev. B 72, (7, Article number: 75405), 1-11 (2005)
M.J.A. de Dood, J. Knoester, A. Tip and A. Polman, Förster transfer and the local optical density of states in erbium-doped silica, Phys. Rev. B 71, (Article number: 115102), 1-5 (2005)
T.J. Kippenberg, A.L. Tchebotareva, J. Kalkman, A. Polman and K.J. Vahala: Purcell factor reduced scattering losses in optical microcavitiesIn: 2005 European Quantum Electronics Conference, Munich, Germany, 12-17 June 2005, New York: IEEE, 2005.
H. Mertens, A. Polman, I.M.P. Aarts, W.M.M. Kessels and M.C.M. van de Sanden, Absence of the enhanced intra-4f transition cross section at 1.5 μm of Er3+ in Si-rich SiO2, Appl. Phys. Lett. 86, (Article number: 241109), 1-3 (2005)
J. Kalkman, L.K. Kuipers, A. Polman and H. Gersen, Coupling of Er ions to surface plasmons on Ag, Appl. Phys. Lett. 86, (Article number: 41113), 1-3 (2005)
A. Polman, T.J. Kippenberg, B. Min, J. Kalkman, R.J. Walters, H.A. Atwater and K.J. Vahala: Towards Er-doped Si nanocrystal sensitized microcavity lasers and amplifiersIn: Proceedings OSA topical meeting on optical amplifiers and their applications held June 27-June 30, 2004, San Francisco, USA, OPG, 2004.
A. Polman, B. Min, J. Kalkman, T.J. Kippenberg and K.J. Vahala, Ultralow-threshold erbium-implanted toroidal microlaser on silicon, Appl. Phys. Lett. 84, 1037-1039 (2004)
H. Isshiki, M.J.A. de Dood, T. Kimura and A. Polman: Erbium-silicon-oxide nano-complexes prepared by wet chemical synthesisIn: Optoelectronics of group-IV-based materials: symposia April 21-April 25, 2003, San Francisco, CA /ed. T. Gregorkiewics, Pittsburgh: MRS, 2004.
