• E.A. Burgemeister and F.W. Saris, Backscattering spectrometry of metal layers on diamond, Appl. Surf. Sci. 6, 489-496 (1980)

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  • I. Yamada, F.W. Saris, T. Takagi, K. Matsubara, H. Takaoka and S. Ishiyama, Crystalline and electrical characteristics of silicon films deposited by ionized-cluster-beams, Jpn. J. Appl. Phys. 19, 181-184 (1980)

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  • W. Windig, P.G. Kistemaker and J.R. Haverkamp, Factor Analysis of the Influence of Changes in Experimental Conditions in Pyrolysis Mass Spectrometry, J. Anal. Appl. Pyrolysis 2, 7-18 (1980)

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  • H.A. van Hoof, Imaging polarizer for the VUV with spherical mirrors, Appl. Opt. 19, 189-190 (1980)

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  • M.M.B. Wijnakker and E.H.A. Granneman, Limitations on mass separation by the weakly ionized plasma centrifuge, Z. Naturforsch. Teil A 35, 883-893 (1980)

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  • G.J. Louter, A.J.H. Boerboom, P.F.M. Stalmeier, H.H. Tuithof and J. Kistemaker, A Tandem Mass Spectrometry for Collision-Induced Dissociation., Int. J. Mass Spectrom. Ion Phys. 33, 335-347 (1980)

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  • A.W. Kleyn, V.N. Khromov and J.H. Los, Observation of molecular motion in a scattering experiment, J. Chem. Phys. 72, 5282-5283 (1980)

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  • J.P. Flamme, T. Mark and J.H. Los, Laser-induced photodissociation of He2+, Chem. Phys. Lett. 75, 419-422 (1980)

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  • H.E. Roosendaal and J.-B. Sanders, On the energy distribution and angular distribution of sputtered particles, Radiat. Eff. 52, 137-144 (1980)

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  • D. Hoonhout, T. de Jong and F.W. Saris, Substrate orientation effect on the regrowth of amorphous silicon by laser pulses, J. Phys. 41, (Colloque C4, Suppl. au no. 5), 89-90 (1980)

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