| Reference |
J. Dieleman, F.H.M. Sanders, A.W. Kolfschoten, P.C. Zalm, A.E. de Vries and R.A. Haring, Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2 and low-energy Ar+ ions, J. Vac. Sci. Technol. B 3, 1384-1392 (1985) |
