| Reference |
R. Schreutelkamp, R. de Reus, F.W. Saris, R.E. Kaim, J.F.M. Westendorp, K.T.F. Janssen and J.J.M. Ottenheim, Structural and electrical characterization of Si(100) implanted with P+ and Si+ ions along the [100] channelling direction, Mater. Sci. Eng. B 7, 149-165 (1990) |
