Strain relaxation during the surfactant modified epitaxial growth of Ge/Si(001) Back to all publications Publication date 1 January 1992 Reference J.M.C. Thornton, A.A. Williams, J.E. MacDonald, R. van Silfhout, M.S. Finney and C. Norris, Strain relaxation during the surfactant modified epitaxial growth of Ge/Si(001), Surf. Sci. 273, 1-8 (1992) Request this article
