Stability of amorphous Ir-Ta diffusion barriers between Cu and Si Back to all publications Publication date 1 January 1990 Reference R. de Reus, R.J.I.M. Koper, H. Zeijlemaker and F.W. Saris, Stability of amorphous Ir-Ta diffusion barriers between Cu and Si, Mater. Lett. 9, 500-503 (1990) Download (pre)print
