| Reference |
P. Sigmund and J.-B. Sanders: Spatial distribution of energy deposited by ion bombardment In: Colloque International sur les Applications des Faisceaux Ioniques a la Technologie des Semiconducteurs = International Conference on Applications of Ions [sic] Beams to Semiconductor Technology, Grenoble, 24-26 Mai, 1967 /ed. P. Glotin, Editions Ophrys, 1967. - pp. 1-23 |
