Reference |
D. Hoonhout and F.W. Saris: Segregation effects in pulsed laser annealing of ion-implanted silicon In: Laser and Electron Beam Processing of Materials : Papers presented at the Symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Mass., November 27-30, 1979 /ed. C.W. White and P.S. Peercy, Academic Press, 1980. - pp. 137-142 |