Secondary defect reduction by channeling implantation of B and P in <100> silicon Back to all publications Publication date 1 January 1991 Reference V. Raineri, R. Schreutelkamp, F.W. Saris, R.E. Kaim and K.T.F. Janssen, Secondary defect reduction by channeling implantation of B and P in <100> silicon, Nucl. Instrum. Methods Phys. Res., Sect B 59/60, 1056-1060 (1991) Request this article