Room-temperature epitaxy of α-CH3NH3PbI3 halide perovskite by pulsed laser deposition

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DOI http://dx.doi.org/10.1038/s44160-024-00717-z
Reference J.S. Solomon, T. Soto-Montero, Y.K. Birkhölzer, D.M. Cunha, W. Soltanpoor, M. Ledinský, N. Orlov, E.C. Garnett, N. Forero-Correa, S.E. Reyes-Lillo, T.B. Haward, J.R.S. Lilly, L.M. Herz, G. Koster, G. Rijnders, L. Leppert and M. Morales-Masis, Room-temperature epitaxy of α-CH3NH3PbI3 halide perovskite by pulsed laser deposition, Nat. Synth., (2025)
Group Nanoscale Solar Cells

Epitaxial growth on lattice-(mis)matched substrates has advanced the understanding of semiconductors and enabled high-end technologies such as III-V-based light-emitting diodes. However, for metal halide perovskites, there is a knowledge gap in thin film heteroepitaxial growth, hindering progress towards new applications. Here we demonstrate the epitaxial growth of cubic (α)-CH3NH3PbI3 films on lattice-matched KCl substrates by pulsed laser deposition at room temperature. Epitaxial stabilization of α-CH3NH3PbI3 is confirmed via reciprocal space mapping, X-ray diffraction pole figures, electron backscatter diffraction and photoluminescence. A bandgap of 1.66 eV stable for over 300 days and Urbach energies of 12.3 meV for 15-nm-thick films are demonstrated. The impact of strain on α-phase stabilization is corroborated by first-principles density functional theory calculations, which also predict substantial bandgap tunability. This work demonstrates the potential of pulsed laser deposition for vapour-phase heteroepitaxial growth of metal halide perovskites, inspiring studies to unlock novel functionalities.