Reduction of secondary defects in MeV ion-implanted silicon by means of ion beam defect engineering Back to all publications Publication date 1 January 1992 Reference Z.L. Wang, B.-X. Zhang, Q.-t. Zhao, Q. Li, J.R. Liefting, R. Schreutelkamp and F.W. Saris, Reduction of secondary defects in MeV ion-implanted silicon by means of ion beam defect engineering, J. Appl. Phys. 71, 3780-3784 (1992) Request this article
