Programmable nanolithography with plasmon nanoparticle arrays

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Publication date
DOI http://dx.doi.org/10.1021/nl0630034
Reference A.F. Koenderink, J.V. Hernández, F. Robicheaux, L.D. Noordam and A. Polman, Programmable nanolithography with plasmon nanoparticle arrays, Nano Lett. 7, 745-749 (2007)
Groups Photonic Materials, Resonant Nanophotonics

We describe how optical contact lithography based on plasmon particle array masks allows generation of a large number of different subwavelength exposure patterns using a single mask. Within an exact point dipole model, we study the local response of silver particles in small two-dimensional arrays with 50-200 nm spacing. We show how illumination with unfocused light allows optically addressing particles either individually or in controlled configurations; which pattern will be exposed by the mask is programmed by varying the wavelength, incidence angle, and polarization of the incident wave.