Mesotaxy by nickel diffusion into a buried amorphous silicon layer Back to all publications Publication date 1 January 1992 Reference Y.N. Erokhin, R. Grotzschel, S.R. Oktyabrsky, S. Roorda, W.C. Sinke and A.F. Vyatkin, Mesotaxy by nickel diffusion into a buried amorphous silicon layer, Mater. Sci. Eng. B 12, 103-106 (1992)
