Mechanisms of sputtering of Si in a Cl2 environment by ions with energies down to 75 eV Back to all publications Publication date 1 January 1988 Reference D.J. Oostra, R.A. Haring, R.P. van Ingen and A.E. de Vries, Mechanisms of sputtering of Si in a Cl2 environment by ions with energies down to 75 eV, J. Appl. Phys. 64, 315-322 (1988) Request this article
