Mass and energy distribution of particles sputter etched from Si in a XeF2 environment Back to all publications Publication date 1 January 1982 DOI http://dx.doi.org/10.1063/1.93451 Reference R.A. Haring, F.W. Saris and A.E. de Vries, Mass and energy distribution of particles sputter etched from Si in a XeF2 environment, Appl. Phys. Lett. 41, 174-175 (1982) Request this article
