| Reference |
R.L. Krans, A. Berntsen and W.C. Sinke: Low temperature tungsten deposition by ArF-laser induced photo-CVD In: Advanced Metallizations in Microelectronics : Symposium held April 16-20, 1990, San Francisco, California, U.S.A. /ed. A. Katz, S.P. Murarka and A. Appelbaum, Materials Research Society, 1990. - pp. 597-601 |
