| Reference |
R. Schlatmann, C. Lu, J. Verhoeven, E.J. Puik and M.J. van der Wiel: Limits to ion beam etching of Mo/Si multilayer coatings In: Physics of X-ray Multilayer Structures, March 2-5, 1992, Jackson Hole Wyoming, Addendum and Postdeadline Papers, Optical Society of America, 1992. |
