Ion channeling and blocking study of ultra-thin NiSi2 films grown on atomically clean Si(111) surfaces

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Reference E.J. van Loenen and J.F. van der Veen: Ion channeling and blocking study of ultra-thin NiSi2 films grown on atomically clean Si(111) surfaces In: Layered Structures, Epitaxy, and Interfaces : Symposium held November 26-30, 1984, Boston, Massachusetts, U.S.A. /ed. J.M. Gibon and L.R. Dawson, Materials Research Society, 1985. - pp. 361-365