Ion-assisted etching of silicon by SF6 Back to all publications Publication date 1 January 1985 Reference D.J. Oostra, R.A. Haring, A.E. de Vries, F.H.M. Sanders and K. Miyake, Ion-assisted etching of silicon by SF6, Appl. Phys. Lett. 46, 1166-1168 (1985) Request this article