Influence of layer thickness on nucleation in amorphous silicon thin films Back to all publications Publication date 1 January 1990 Reference S. Roorda, D. Kamman, W.C. Sinke, G.F.A. van de Walle and A.A. van Gorkum, Influence of layer thickness on nucleation in amorphous silicon thin films, Mater. Lett. 9, 259-262 (1990)
