| Reference |
A.D. Kuypers, H.J. Hopman and E.H.A. Granneman: High flux low energy reactive ion etching in a magnetic multipole reactor In: MicroProcess 89 : Proceedings of the 1989 International Symposium on MicroProcess Conference, July 2-5, 1989, Kobe, Japan /ed. S. Namba and T. Kitayama, Publication Office, Japanese Journal of Applied Physics, 1989. - pp. 205-208 |
