Features of formation of Ni/C multilayer X-ray mirrors manufactured by electron-beam vaporization completed with an ion-beam etching

By methods of hard (1,54 nm) and soft (3 16 nm) X-ray diffraction and electron microscopy, the growth peculiarities of single Ni layers and Ni/C multilayers are studied. They are fabricated by thermal evaporation with subsequent Kr⁺ ion etching (E ~ 300 eV, a = 45degrees) of metal layers only NKalpha (316 nm) radiation is used for in situ control of layer thicknesses Behaviour regularities leading to the interface smoothing in multilayers are revealed Island-like growth mode for Ni layers with a thickness less than 6 nm is also revealed Increase of interface roughness from 0 21 till 0 54 nm is observed in Ni/C multilayer with 10 periods Ion etching of metal layers takes place without changes of roughness and disruption of continuousness under thinning of Ni from ~ 6 down to 2 nm.

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