Failure temperature of amorphous Cu-Ta alloys as diffusion barriers in Al-Si contacts Back to all publications Publication date 1 January 1985 Reference F.W. Saris, L.S. Hung, M. Nastasi, J.W. Mayer and B. Whitehead, Failure temperature of amorphous Cu-Ta alloys as diffusion barriers in Al-Si contacts, Appl. Phys. Lett. 46, 646-648 (1985) Request this article
