Extension of the model for Ar+ ion induced etching of Si by SF6 Back to all publications Publication date 1 January 1987 Reference G.N.A. van Veen, F.H.M. Sanders, J. Dieleman, P.C. Zalm, D.J. Oostra and A.E. de Vries, Extension of the model for Ar+ ion induced etching of Si by SF6, Nucl. Instrum. Methods Phys. Res., Sect B 19/20, 1022-1025 (1987) Request this article
