| Reference |
M. Miyao, A. Polman, R. van Kemp, J.F.M. Westendorp, W.C. Sinke, J.F. van der Veen and F.W. Saris: Electron and ion beam activated solid phase epitaxy of ion-implanted silicon In: Energy Beam-Solid Interactions and Transient Thermal Processing, 1985, IV : May 13th - 15th 1985, Strasbourg (France) /ed. V.T. Nguyen and A.G. Cullis, Editions de Physique, 1985. - pp. 181-185 |
