Dependence of the temperature behaviour of the sputtering ratio on the channelled fraction of the ion beam Back to all publications Publication date 1 January 1973 Reference H.E. Roosendaal and J.J.P. Elich, Dependence of the temperature behaviour of the sputtering ratio on the channelled fraction of the ion beam, Radiat. Eff. 19, 127-128 (1973)
