Channeling implantation of B and P in silicon Back to all publications Publication date 1 January 1991 Reference R. Schreutelkamp, V. Raineri, F.W. Saris, R.E. Kaim, J.F.M. Westendorp, P.F.H.M. van der Meulen and K.T.F. Janssen, Channeling implantation of B and P in silicon, Nucl. Instrum. Methods Phys. Res., Sect B 55, 615-619 (1991) Request this article
