| Reference |
R. Schreutelkamp, W.X. Lu, F.W. Saris, K.T.F. Janssen, J.J.M. Ottenheim, R.E. Kaim and J.F.M. Westendorp: Avoiding transient diffusion of boron in Si(100) In: Beam-Solid Interactions : Physical Phenomena : Symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A. /ed. J.A. Knapp, P. Borgesen and R.A. Zuhr, Materials Research Society, 1990. - pp. 691-696 |
