Avoiding dislocations in ion-implanted silicon Back to all publications Publication date 1 January 1992 Reference F.W. Saris, J.S. Custer, R. Schreutelkamp, R.J. Liefting, R.C.M. Wijburg and H. Wallinga, Avoiding dislocations in ion-implanted silicon, Microelectron. Eng. 19, 357-362 (1992) Request this article
