Argon-ion assisted etching of silicon by molecular chlorine Back to all publications Publication date 1 January 1984 Reference A.W. Kolfschoten, R.A. Haring and A.E. de Vries, Argon-ion assisted etching of silicon by molecular chlorine, J. Appl. Phys. 55, 3813-3818 (1984) Request this article
