| Reference |
A. Berntsen, P.A. Stolk, W.F. van der Weg and F.W. Saris: Annealing of ion-implanted hydrogenated amorphous silicon: Stable and removable damage In: Amorphous Silicon Technology-1993 : Symposium held April 13-16, 1993, San Francisco, California, U.S.A. /ed. E.A. Schiff, M.J. Thompson, A. Madan, K. Tanaka and P.G. Lecomber, Materials Research Society, 1993. - pp. 303-308 |
