| Reference |
J.F.M. Westendorp, Z.L. Wang and F.W. Saris: An ion-scattering study of oxygen indiffusion during pulsed laser annealing/cleaning of silicon In: Laser and Electron-Beam Interactions with Solids : Proceedings of the Materials Research Society Annual Meeting, November 1981, Boston Park Plaza Hotel, Boston, Massachusetts, U.S.A. /ed. B.R. Appleton and G.K. Celler, North-Holland, 1982. - pp. 255-260 |
