A novel process to form epitaxial Si structures with buried silicide

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Reference Y.N. Erokhin, R. Grotzschel, S.R. Oktyabrsky, S. Roorda, W.C. Sinke and A.F. Vjatkin: A novel process to form epitaxial Si structures with buried silicide In: Phase Formation and Modification by Beam-Solid Interactions : Symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A. /ed. G.S. Was, L.E. Rehn and D.M. Follstaedt, Materials Research Society, 1992. - pp. 313-318