Reference |
D. Hoonhout and F.W. Saris: Threshold energy density for pulsed laser annealing of silicon In: Laser and Electron-Beam Solid Interactions and Materials Processing : Proceedings of the Materials Research Society Annual Meeting, November 1980, Copley Plaza Hotel, Boston, Massachusetts, U.S.A. /ed. J.F. Gibbons, L.D. Hess and T.W. Sigmon, North Holland, 1981. - pp. 31-37 |