| Reference |
A. Polman, E. Snoeks, G.N. van den Hoven, J.S. Custer, B.L.M. Hendriksen, M.B.J. Diemeer, J.W.M. van Uffelen, Y.S. Oei, M.K. Smit, M. Fleuster and C. Buchal: Erbium ion implantation doping of opto-electronic materials operating at 1,5 In: 19th European Conference on Optical Communication, September 12-16, 1993, Centre de Congrès det d'Expositions, Montreaux, Switzerland, Proceedings vol. 2 (Regular papers), [s.n.], 1993. - pp. 61-64 |
