An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(a, a0)16O resonance scattering Back to all publications Publication date 1 January 1983 Reference Z.L. Wang, J.F.M. Westendorp and F.W. Saris, An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(a, a0)16O resonance scattering, Nucl. Instrum. Methods Phys. Res. 211, 193-201 (1983) Request this article
