Al2O3/TiO2 nano-pattern antireflection coating with ultralow surface recombination

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Publication date
DOI http://dx.doi.org/10.1063/1.4810970
Reference P. Spinelli, B. Macco, M.A. Verschuuren, W.M.M. Kessels and A. Polman, Al2O3/TiO2 nano-pattern antireflection coating with ultralow surface recombination, Appl. Phys. Lett. 102, (23, Article number: 233902), 1-4 (2013)
Group Photonic Materials

We present a nano-patterned dielectric coating for crystalline Si solar cells that combines excellent anti-reflection and passivation properties. The nano-patterned coating comprises an array of TiO2 nanocylinders placed on top of an ultra-thin Al2O3 layer on a flat Si(100) wafer. The antireflection effect stems from the preferential forward scattering of light through leaky Mie resonances in the TiO2 nanocylinders. The Al2O3 layer provides excellent passivation of the Si surface. We experimentally demonstrate ultralow surface recombination with carrier lifetimes above 4 ms, combined with a reflectivity of 2.8% averaged over a broad spectral range.