Silicon waveguide

Suss Delta 80 Spin coater

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Spin coating is a procedure to apply a uniform thin photoresist film to flat substrates. Also other materials can be applied, for instance quantum dots. The Delta 80 is equipped with the GYRSET® closed cover system.

Specifications

cleanroom uniform resist coater at low spin speeds amsterdam nanocenter

  • Flat substrates up to 4 inch or fragments
  • Substrate thickness max 12 mm
  • Max. spin speed 4000 rpm with closed cover
  • Max. spin speed 1000 rpm with open cover
  • Storage of 20 recipes with up to 30 steps
  • Yields uniform coating thickness up to 100 micron

More: Wikipedia – Spin coating