Suss Delta 80 Spin coater

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Spin coating is a procedure to apply a uniform thin photoresist film to flat substrates. Also other materials can be applied, for instance quantum dots. The Delta 80 is equipped with the GYRSET® closed cover system.

Specifications

cleanroom uniform resist coater at low spin speeds amsterdam nanocenter

Flat substrates up to 4 inch or fragments
Substrate thickness max 12 mm
Max. spin speed 4000 rpm with closed cover
Max. spin speed 1000 rpm with open cover
Storage of 20 recipes with up to 30 steps
Yields uniform coating thickness up to 100 micron

More
Wikipedia – Spin coating